Equipment use:

The developing cleaning and drying line is a hardware etching pre-processing supporting device, and is mainly used for the photosensitive etching process. After the exposure, the surface pattern of the product is revealed, and then enters the etching process, which can realize continuous mass production, save labor, and greatly improve work efficiency. . Process: Feeding → Development → Inspection → Level 2 Washing → Discharge

 

Machine parameters:

Machine model: XHL-XY1200;

Equipment outer diameter: 4100*1760*1500mm;

Development area: 700*1200mm;

Cleaning area: 700*600mm*2

Developing pump: 5.5KW*1 set;

Cleaning pump: 2.2KW*2 units;

Heating pipe: 3KW titanium alloy heating pipe;

Temperature control: temperature display automatic heating system;

Spray method: independent nozzle high pressure spray;

Filtration system: full pressure filter *3;

Power: 13.5KW;

Power supply: 380V/50HZ

 

working principle:

1. Apply a layer of photosensitive ink on the surface of the product, the ink can not see strong light, otherwise it will solidify, resulting in no development;

2. The ink is baked and then attached to the film for exposure. The film is a transparent black and white film, the black part will block the light, and the white part will be transparent;